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Expert in Physics, Optics, Applied Mathematics, Algorithm Development, Electromagnetics, Quantum Theory
Available for your Consulting and Expert Witness Needs
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Summary of Expertise:
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Listed with other top experts in: |
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Expert has spent over 20 years developing mathematical algorithms, techniques and approaches to solve fundamental physics and engineering issues as well as model, analyse and/or design solutions to practical real world problems. He has a strong background in advanced mathematics, field theory, quantum field theory and all aspects of electromagnetic simulation. He is a expert in using Mathematica(TM) to develop and test algorithms and to generate numerical solutions to particular problems. He has also done significant work on statistics and probability as applied to a wide range of engineering and data analysis problems as well as on the fundamental mathematics of probability itself.
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He has spent over 20 years developing algorithms for performing optical and electromagnetic modeling and analysis in all areas of optics including diffraction, polarized diffraction, coherent and partially coherent imaging, interferometry, aberrations, flare, statistical optics, scattering, guided waves, surface plasmons, fiber optics, laser beam propagation and quantum optics. He has used propagators and Greens functions, including Feynman path integrals to compute diffraction in interferometric systems, laser doppler systems and gradient index optics. He has written exact electromagnetic solvers based on various techniques such as RCWA and eigenmode expansions for computing the scattering and diffraction from structured materials such as layered gratings, semiconductor wafers and optical masks.
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He spent two years at Bell Labs working on the projection ebeam lithography tool know as SCALPEL. There he performed modeling, analysis and design in all aspects of the SCALPEL tool and on electron-beam lithography in general.
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Show Secondary and Basic Areas of Expertise | Localities: Expert may consult nationally and internationally, and is also local to the following cities: New York, New York;
Yonkers, New York;
Newark, New Jersey;
Jersey City, New Jersey;
Paterson, New Jersey;
Bridgeport, Connecticut;
New Haven, Connecticut;
Worcester, Massachusetts;
Springfield, Massachusetts;
and Providence, Rhode Island.
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| Year |
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Degree |
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Subject |
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Institution |
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1981
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PhD
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Theoretical/Mathematical Physics
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Penn State
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1973
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BS
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Physics
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Penn State
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| Years |
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Employer |
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Department |
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Title |
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Responsibilities |
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2005 to
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(Undisclosed)
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Owner
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He a consultant in applied mathematics, applied physics and applied optics.
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2000 to 2005
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IBM, TJ Watson Research Center
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TCAD
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Research Scientist
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He was responsible for analysis and modeling of all aspects of semiconductor fabrication.
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1998 to 2000
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Bell Labs, Lucent Technologies
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Member of Technical Staff
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He was responsible for design, analysis and modeling of the various sub-systems of the projection e-beam lithoghraphy tool called SCALPEL
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1990 to 1998
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SVG Lithography
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Senior Physicist
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He was responsible for the design, analysis and modeling of the optical lithography tools.
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1984 to 1990
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Hughes Danbury Optical Systems
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Senior Researcher
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He was responsible for analysis and modeling of optical and laser systems.
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1982 to 1984
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Fairfield University
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Assistant Professor of Physics
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He taught introductory and advanced physics courses.
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Associations/Societies
He is a member of the American Physical Society.
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| Publications: |
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Publications and Patents Summary
He has over 15 patents in all areas of semiconductor fabrication ranging from modeling and analysis to subsystem designs.
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| Selected Consulting Examples: |
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He provided diffraction and physical optics analysis of laser interferometry including the effects of turbulence.
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He worked on the development of E&M simulation code for computing the topography of a structure from scanning white light interferometry signals.
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He determined the origin, parametric dependencies and impact of speckle in projection imaging systems.
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He derived from first principles a model which describes the origin and parametric scaling laws for line edge roughness in pattern produced in a chemically amplified photoresist during standard lithographic fabrication of computer and memory chips.
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He performed system engineering analysis of the effect of gas and fluid flow at low Knudsen numbers on heat transfer properties of structure.
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Expert for a free initial screening call regarding your expert consulting needs.
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Expert is free.
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| International Experience: |
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Summary |
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Japan
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He consulted for a Japanese lithography company.
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China
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He consulted for a Chinese semiconductor equipment manufacturer.
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| Language Skills: |
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| Foreign Language |
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Description |
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Spanish
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He is reasonably fluent in Spanish.
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Japanese
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He speaks a little Japanese.
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Mandarin
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He speaks a little Mandarin.
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He has extensive experience and background in the area of semiconductor fabrication, lithography and lithographic simulation and hardware.
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Expert for a free initial screening call regarding your marketing research, industry research, and company
research needs. For research needs involving multiple experts or secondary research,
a Research Director can be assigned to coordinate the work into a custom report for you as a potentially quicker
and more cost effective alternative to doing this work yourself or hiring a boutique consultancy.
Remember, your initial screening call to speak with
Expert is free.
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| Additional Skills and Services: |
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Training/Seminars
He taught a 3 Day course on statistical optics and speckle and it's impact on semiconductor fabrication.
He taught a 1/2 day course on line edge roughness (LER) in photoresist.
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Other Skills and Services
He has expertise in physics, math and engineering allows me to attack, analyse and solve real world problems that do not fall into the standard engineering categories of electrical, mechanical and so on, but rather lie at the intersection of various disciplines.
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