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 Expert  723210 
Expert in Advanced Semiconductor Lithography

Available for your Consulting and Expert Witness Needs

California (CA)
 USA
Expertise Education Work History Career AccomplishmentsConsulting Services Expert Witness Market Research
Summary of Expertise:
Primary Expertise Areas:

(links show more experts in each area)

Expertise Description:

electron-beam lithography expert

semiconductor wafer mask aligner expert

 
Expert has worked in electron beam lithography research and application since graduate school. Specifically he developed new pattern generation techniques for improved throughput and accuracy. He also developed a new generation of electron beam mask writer. His work on the multi-beam electron beam direct-write system involved all aspects of system design. Direct-write electron beam is still a promising alternative expensive masked lithography.

optical microlithography expert

 
At Nikon, Expert developed new optical lithography concepts and installed the system in major US laboratories. He also developed many subsystem concepts for alignment and lens testing using precision mechanics and machine vision.

semiconductor lithography expert

 
Semiconductor lithography has evolved from contact mask lithography to the use of short wavelength light in projection or particle beams. Expert has contributed to research and application in each of these methods. His hands-on experience is with ion beams, electron beams, x-rays, and optics. Semiconductor lithography is the key to denser integrated circuits. More recent work has helped define the ultimate limits.

X-ray lithography expert

 
In 1973, Expert developed an x-ray lithography system just one year after its first publication. His work resulted in a system for micron lithography. He worked on mask technology, x-ray sources , and alignment. Later he worked to transfer and perfect the x-ray lithography of a major industrial lab.

optical lens testing expert

 
Show Secondary and Basic Areas of Expertise
Localities:
Expert may consult nationally and internationally, and is also local to the following cities:  San Francisco, California;  Sacramento, California;  Oakland, California;  Stockton, California;  Fremont, California;  Modesto, California;  Santa Rosa, California;  Hayward, California;  Concord, California;  and Reno, Nevada.

Education:
Year   Degree   Subject   Institution  
1970   PhD   Electrical Engineering   University of Southern California  
1966   MS   Electrical Engineering   University of Southern California  
1964   BS   Engineering   California Institute of Technology  

Work History:
Years   Employer   Department   Title   Responsibilities
2001 to   (Undisclosed Consulting Company)     Consultant/owner   Expert has consulted in technical, marketing, and intellectual property issues regarding advanced semiconductor lithography-optical, x-ray, and electron beam. He also consults in precision mechanisms and materials especially as applied to lithography.
1998 to 2000   Ion Diagnostics Inc     Senior Scientist and Systems Manager   Expert solved system design issues and contributed to marketing and IP strategies for a multi-beam multi-column electron beam lithography system for the Next Generation Lithography requirements of the International Technology Roadmap
1990 to 1998   Nikon Research Corp of America     R and D Project Manager   Expert contributed as senior staff and program manager on advanced semiconductor lithography. His last project was the joint IBM-Nikon electron beam projection system (similar to SCALPEL). Other projects included system design, electronics, and software for an optics calibration system, machine vision for alignment and inspection, software development for picture editing, and system design for flat panel display lithography.
1986 to 2000   Nikon Precision Inc     Senior Manager   Expert was project manager for four beta test excimer laser steppers including all aspects of specification negotiation, delivery, installation, and joint evaluation. In addition he managed the demonstration and research laboratory which included designing a new 5000 square foot facility, supervision of six engineers and their projects in stepper characterization, resist evaluation, and system software
1982 to 1986   Varian Associates   Lithography Division   Engineering Manager   At Varian Expert directed the development of an X-ray lithography system with responsibility for transferring licensed technology, developing government contracts, helping create a business plan, staffing, and supervising the electronic, software, and mechanical engineering effort. He also served as acting Manager of Software Development and Support for Varian's E-beam mask making product, a position involving supervision of eight software engineers and strong customer interaction. Initially Expert managed electronics development for the Varian VLS-80 e-beam mask making system which featured a faster 80 MHz data rate, semiconductor memory, and improved overlay.
1979 to 1982   Rockwell International   Microelectronics R&D Center   Senior MTS   For Rockwell Expert established of a computerized lab for characterization of submicron CMOS-SOS and bulk IC devices and for developing programs in lithography and military radiation effects, including the VHSIC military program. Advanced lithography systems included electron beam and X-ray.
1969 to 1979   Hughes Aircraft   Hughes Research Laboratories   MTS   Expert was Program Manager and Principal Investigator for precision mask alignment contract with the US. Navy and responsible for pattern generator and applications for focused ion beam lithography. He carried out early experiments on energy losses and materials for masked ion beam lithography and co-originated a pioneer program in x-ray lithography and made major contributions to source optimization and design, to masks, to mask alignment, to resist evaluation, to process technology for IC fabrication, and to radiation effects on MOS devices. In previous work at Hughes Expert developed high power hybrid microcircuits involving circuit design, exotic materials, and analysis.

Career Accomplishments:
Associations/Societies

SPIE, IEEE

Professional Appointments

Treasurer IEEE Lithography Workshop

Publications and Patents

He has 14 publications and 11 patents in the field of advanced lithography and material properties


Consulting Services:
Expert worked on-site to build and check-out an accelerated test system for polymer coatings.
 
As a member of the Intota consultant network, Expert is a specialist who provides technical consulting to corporate, legal and government clients.  Expert provides professional consulting as an Advanced Semiconductor Lithography Consultant.  Expert may consult as an independent consultant or as a member of a consultancy, consulting company, or consulting firm.  Consultants service will be covered by a consulting contract.   Ask an expert initial screening questions and ask the experts services particulars, by simply submitting an expert request.

Expert Witness:
Expert provided depositions to an intellectual property suit involving precision mechanism for semiconductor lithography and in a second case involving characterization of materials with electron beams and lasers.

Intota experts can serve as expert witnesses or litigation consultants offering expert testimony, expert advice, litigation support, forensic services, and related expert witness services.  Expert can serve as an expert witness or litigation consultant in intellectual property (patent, trademark, trade secret, copyright), product liability, and insurance matters.  Expert may provide forensic expert witness testimony, litigation consulting services, forensic investigation, and forensic testing if appropriate in litigation areas as an Advanced Semiconductor Lithography Expert Witness.   Intota provides attorneys and legal professionals the opportunity to ask an expert initial screening questions and ask the experts services particulars by submitting an expert request.

International Experience:
Years   Country / Region   Summary
1993 to 1993   Japan   Expert implemented tests of machine vision to perform alignment of LCD flat panel lithography systems.
1995 to 1995   Japan   Expert installed and proved a lens testing system in an optics factory.

Market Research:
Expert contibuted to the marketing of advanced lithography systems to semiconductor manufacturing.

Expert serves as a resource to Intota Market Research Services for customized marketing research in industries or areas related to Advanced Semiconductor Lithography.   Experts are an invaluable source of overall industry insight as well as insight into specific companies and firms for custom business to business (b2b) and industrial market research.  Intota uses analyst and consultant resources from Guideline whose Research Directors manage the research and analysis of the qualitative and quantitative data as well as report writing for the custom studies.  The methods and tools used by Intota market research combine the insights of technical experts and industry insiders with secondary research to provide the custom b2b and industrial market research you need.

Additional Skills and Services:
Supplier and Vendor Location and Selection

He has extensive experience in evaluating and selecting materials and vendors for ceramic structures, ceramic-metal composites, insulations, linear motors, and fiber optic components.

Other Skills and Services

Considerable experience in prior art evaluation for lithography and related semiconductor equipment.


 
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